Article

Article title APPLICATION OF PROBE NANOLITHOGRAPHY FOR NANOELECTRONICS ELEMENTS FORMATION BY LOCAL ANODIC OXIDATION OF TITANIUM FILM
Authors V.A. Smirnov
Section SECTION I. NANOELECTRONICS
Month, Year 09, 2014 @en
Index UDC 621.38-022.532
DOI
Abstract In this paper, experimental studies of the possibility of forming oxide nanostructures on the surface of a thin film of titanium during local anodic oxidation (LAO) in vector and raster modes. The results of the formation of nanoelectronics elements structures by local anodic oxidation in vector and raster mode on the surface of a thin titanium film. The influence of the modes of opera- tion of an atomic force microscope on the surface of the LAO process of a thin film of titanium. The influence of the duration of the voltage pulses applied to the tip-substrate system for geometrical parameters of the ONS titanium. It is shown that by increasing the voltage pulse duration from 10 to 100 ms is an increase in the height of oxide nanostructures from 0,58 ± 0,18 to 1,37 ± 0,32 nm. Using raster method of LAO in thin film of titanium were obtained matrix of 25 memristors, and the metal nanoelectronics element based on nanoscale conduction channel with lateral dimensions of about 10 nm. The results obtained can be used to develop technological processes of nanoelectronics element base using probe nanotechnology.

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Keywords Nanotechnology; nanomaterials; atomic force microscopy; local anodic oxidation; thin titanium film; oxide nanostructures; nanolithography.
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