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Article title THERMODYNAMIC ANALYSIS OF INTERACTION IN THE Ni-Cr-Si AT Ni-Cr-Si GROWTH OF CARBON NANOTUBES BY CHEMICAL VAPOR DEPOSITION
Authors O.I. Ilin, V.S. Klimin, M.V. Rubashkina, K.S. Sergienko, A.S. Semenov, А.А. Fedotov, Thcin Van Myoi, V.Yu. Yanenko
Section SECTION II. NANOMATERIALS
Month, Year 09, 2014 @en
Index UDC 621.38-022.532
DOI
Abstract In work carried out thermodynamic analysis of reactions interfacial structure: Ni(10 nm)/Cr(20nm)/Si(380μm), who showed that at the initial heating stage, Ar serves for displacing the residual gas atmosphere, and NH3 and H2 bind free O2. In step activation NH3 role is to restore it from Ni compounds with O2 and Cr, thus forming a conductive underlayer CrN/Cr2N. It is also shown that regardless of the phase state of Ni, it decomposes to release C2H2 carbon. Thus under catalytic sites formed underlayer CrN/Cr2N/Cr, which prevents the penetration of nickel Si substrate and oxidation of Si, and a conductive sublayer to ensure electrical contact for carbon nanotubes (CNT). Experiments have been conducted on the formation of catalytic sites on the structure, followed by the growth of an array of vertically aligned carbon nanotubes. The results can be used to develop procedures for the selection of materials and the determination of the modes of growth of CNTs by plasma chemical vapor deposition (PECVD), as well for determining the criteria for the structure which will form the catalytic sites with subsequent growth of CNTs.

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Keywords Nanotechnology; nonmaterial; oriented carbon nanotubes; thermodynamic analysis; catalytic sites; chemical vapor deposition.
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