Article

Article title STUDY EFFECT OF PLASMA ETCHING GALLIUM ARSENIDE SURFACE IN PLASMA OF BCL3\AR\SF6
Authors V.S. Klimin, A.V. Eskov, N.N. Petrov
Section SECTION I. NANOELECTRONICS
Month, Year 09, 2015 @en
Index UDC 389.159
DOI
Abstract This article deals with the problems of plasma chemical etching of structures based on gallium arsenide. Analyzed the characteristics of the technology, it is shown that the plasma-chemical method in comparison with the liquid is high anisotropy etching process and the absence of the need for additional steps for removing the reaction products from the surface and outside of impurities contained in the initial reagents. For the experimental investigation of the interaction of GaAs with a inductively coupled plasma used cylindrical flow plasma chemical reactor. The pressure of a mixture of plasma-forming gas was 2 Pa. As experimental samples were used fragments GaAs wafers, having a standard liquid surface after polishing. Preparation of the substrate of gallium arsenide was that the surface was applied a pattern of a protective mask of photoresist plazmostoykogo. The influence of different power sources, the thickness of the plasma etched layer by etching the surface of gallium arsenide by the plasma chemical environment of process gases BCL3\AR\SF6. The analysis of the surface by atomic force microscopy, the etched surface roughness was studied. It is shown that for large power source inductively coupled plasma etched layer thickness increases, due to the large number of particles, are responsible for the formation of volatile compounds from the reaction products of reactive-ion etching. It was also shown that the rate of etching of GaAs over time with increasing power, and thus the bias voltage increases. It was found that when the power source is inductively coupled plasma burr remains relatively constant, and changes in capacitance of the plasma source power increases the rms roughness of the etched surface.

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Keywords Nanotechnology; nanostructures; nanomaterials; gallium arsenide; plasma etching; planar technolog ; atomic force microscopy.
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